DocumentCode :
1300704
Title :
Low-threshold current, high-efficiency 1.3-μm wavelength aluminum-free InGaAsN-based quantum-well lasers
Author :
Gokhale, M.R. ; Studenkov, P.V. ; Wei, J. ; Forrest, S.R.
Author_Institution :
Dept. of Electr. Eng., Princeton Univ., NJ, USA
Volume :
12
Issue :
2
fYear :
2000
Firstpage :
131
Lastpage :
133
Abstract :
We demonstrate high-performance Al-free InGaAsN-GaAs-InGaP-based long-wavelength quantum-well (QW) lasers grown on GaAs substrates by gas-source molecular beam epitaxy using a RF plasma nitrogen source. Continuous wave (CW) operation of InGaAsN-GaAs QW lasers is demonstrated at /spl lambda/=1.3 μm at a threshold current density of only J/sub TH/=1.32 kA/cm2. These narrow ridge (W=8.5 μm) lasers also exhibit an internal loss of only 3.1 cm/sup -1/ and an internal efficiency of 60%. Also, a characteristic temperature of T0=150 K from 10/spl deg/C to 60/spl deg/C was measured, representing a significant improvement over conventional /spl lambda/=1.3 μm InGaAsP-InP lasers. Under pulsed operation, a record high maximum operating temperature of 125/spl deg/C and output powers greater than 300 mW (pulsed) and 120 mW (CW) were also achieved.
Keywords :
III-V semiconductors; chemical beam epitaxial growth; gallium arsenide; gallium compounds; indium compounds; laser beams; optical fabrication; optical losses; quantum well lasers; ridge waveguides; waveguide lasers; 1.3 mum; 10 to 60 C; 120 mW; 125 C; 150 K; 300 mW; 60 percent; CW operation; GaAs; GaAs substrates; InGaAsN-GaAs; InGaAsN-GaAs QW lasers; InGaAsN-GaAs-InGaP; InGaAsN-GaAs-InGaP-based quantum-well lasers; InGaAsN-based quantum-well lasers; InGaAsP-InP lasers; N/sub 2/; RF plasma N/sub 2/ source; characteristic temperature; continuous wave operation; gas-source molecular beam epitaxy; high-performance lasers; internal efficiency; internal loss; long-wavelength quantum-well lasers; maximum operating temperature; narrow ridge lasers; output powers; pulsed operation; threshold current density; Gallium arsenide; Gas lasers; Molecular beam epitaxial growth; Plasma density; Plasma sources; Plasma temperature; Plasma waves; Quantum well lasers; Radio frequency; Substrates;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.823493
Filename :
823493
Link To Document :
بازگشت