The Effect of Deposition Temperature and Work Pressure on Ti–B–C Nanocomposite Coating Prepared by Multitarget Magnetron Cosputtering

Author

Liu, M.Y. ; Yan, J.Y. ; Zhang, S. ; Dong, L. ; Cao, M. ; Deng, X.Y. ; Li, D.J.

Author_Institution

Coll. of Phys. & Electron. Inf. Sci., Tianjin Normal Univ., Tianjin, China

Volume

39

Issue

11

fYear

2011

Firstpage

3115

Lastpage

3119

Abstract

Ternary Ti-B-C nanocomposite coatings were synthesized on a Si(100) wafer and stainless steel substrates from Ti and B₄C targets, respectively, by multitarget magnetron cosputtering. Extensive measurements were taken to investigate the influences of deposition temperature and work pressure on microstructure, hardness, elastic modulus, residual stress, friction coefficient, and adhesion strength. The maximum hardness of 42 GPa occurred at the deposition temperature of 400^°C and work pressure of 0.5 Pa. The hardest coating also showed the lowest residual stress and the highest critical load. These enhancement effects should be related to nanocrystalline structure formation.

Keywords

adhesion; boron compounds; elastic moduli; elasticity; friction; hardness; internal stresses; nanocomposites; nanofabrication; sputter deposition; sputtered coatings; titanium compounds; Si; Si(100) wafer; TiBC; adhesion strength; deposition temperature effect; elastic modulus; friction coefficient; hardness; microstructure; multitarget magnetron cosputtering; nanocrystalline structure formation; pressure 0.5 Pa; residual stress; stainless steel substrates; temperature 400 degC; ternary nanocomposite coatings; work pressure; Amorphous magnetic materials; Chemicals; Coatings; Friction; Plasma temperature; Residual stresses; Substrates; Hardness; Ti–B–C coating; multitarget magnetron cosputtering; nanocomposite coating;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2011.2162081

Filename

5989870