Title :
Poly-Si/SiO2 laminated walk-off polarizer having a beam-splitting angle of more than 20
Author :
Muro, Kouichi ; Shiraishi, Kazuo
Author_Institution :
Fac. of Eng., Utsunomiya Univ., Japan
fDate :
1/1/1998 12:00:00 AM
Abstract :
A spatial walk-off polarizer having a split angle of more than 20° in both the 1.3 and 1.5 μm wavelength regions has been fabricated for the first time. The polarizer consists of alternate laminated layers of poly-Si and silica. The new polarizer makes the best use of the characteristics of crystal Si, namely high refractive index, and low absorption coefficients in the longer wavelength regions. A rather simplified fabrication process that utilizes the RF sputtering method is also proposed, in which only the oxygen-intake valve is used to control the deposition of poly-Si and silica layers from a single-crystal Si target. The fabricated polarizer has beam splitting angles as large as 22 and 21° at wavelengths of 1.30 and 1.55 μm, respectively, being roughly four times larger than those of rutile or calcite
Keywords :
absorption coefficients; optical fabrication; optical films; optical polarisers; refractive index; silicon; silicon compounds; sputter deposition; 1.3 mum; 1.5 mum; RF sputtering method; Si-SiO2; alternate laminated layers; beam splitting angles; beam-splitting angle; fabricated polarizer; high refractive index; low absorption coefficients; oxygen-intake valve; poly-Si/SiO2 laminated walk-off polarizer; simplified fabrication process; spatial walk-off polarizer; split angle; sputter deposition; Absorption; Fabrication; Optical devices; Optical fiber polarization; Optical films; Optical materials; Optical polarization; Radio frequency; Refractive index; Silicon compounds;
Journal_Title :
Lightwave Technology, Journal of
