DocumentCode :
1301706
Title :
Base-emitter injection characterization in low-temperature pseudo-heterojunction bipolar transistors
Author :
Yano, Kazuo ; Nakazato, Kazuo ; Miyamoto, Masafumi ; Aoki, Masaaki ; Shimohigashi, Katsuhiro
Author_Institution :
Hitachi Ltd., Tokyo, Japan
Volume :
37
Issue :
10
fYear :
1990
fDate :
10/1/1990 12:00:00 AM
Firstpage :
2222
Lastpage :
2229
Abstract :
Carrier injection characteristics in a pseudo-heterojunction bipolar transistor (pseudo-HBT) are clarified both theoretically and experimentally. It is found that a low-concentration external-base structure completely rejects carrier injections and selectively injects electrons into the intrinsic base at low temperatures. This unique property inherent in low-temperature operation is verified in an experimental pseudo-HBT. Based on the results, the vertical and horizontal scaling rules for pseudo-HBTs are clarified. The analysis reveals that the low-temperature bipolar transistor has a very small emitter- and external-base charging time, which allows excellent vertical and horizontal scalability for superior to that of conventional room-temperature transistors
Keywords :
elemental semiconductors; heterojunction bipolar transistors; semiconductor device models; silicon; Si; base emitter injection characterisation; carrier injection rejection; horizontal scalability; horizontal scaling rules; low temperatures; low-concentration external-base structure; low-temperature bipolar transistor; low-temperature operation; pseudo-HBT; pseudo-heterojunction bipolar transistors; selectively injects electrons; semiconductors; small charging times; vertical scalability; vertical scaling rules; Bipolar transistors; CMOS technology; Electrons; Helium; Laboratories; Photonic band gap; Scalability; Temperature distribution; Tunneling; Wiring;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.59912
Filename :
59912
Link To Document :
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