DocumentCode :
1301957
Title :
Modeling and Experimental Verification of Misalignment Tolerance in Inductive-Coupling Inter-Chip Link for Low-Power 3-D System Integration
Author :
Niitsu, Kiichi ; Kohama, Yoshinori ; Sugimori, Yasufumi ; Kasuga, Kazutaka ; Osada, Kenichi ; Irie, Naohiko ; Ishikuro, Hiroki ; Kuroda, Tadahiro
Author_Institution :
Dept. of Electron. & Electr. Eng., Keio Univ., Yokohama, Japan
Volume :
18
Issue :
8
fYear :
2010
Firstpage :
1238
Lastpage :
1243
Abstract :
Modeling and experimental verification of misalignment tolerance in inductive-coupling inter-chip links for 3-D system integration is introduced for the first time. Misalignment between stacked chips reduces coupling coefficiency of on-chip inductors and increases transmitter power. We proposed a modeling which estimates the increase in transmitter power by considering misalignment as an additional communication distance. Proposed model was verified by electromagnetic simulations and by measurements using testchips fabricated in 65-nm CMOS technology. The results calculated by the proposed modeling match well with measurement results. Measurement results show that misalignment tolerance of inductive-coupling link is well high and can be ignored in common conditions.
Keywords :
CMOS integrated circuits; low-power electronics; three-dimensional integrated circuits; CMOS technology; coupling coefficiency; electromagnetic simulation; inductive-coupling interchip link; low-power 3D system integration; misalignment tolerance; on-chip inductor; size 65 nm; High-speed interconnect; SiP; low-power design; misalignment; wireless interconnect;
fLanguage :
English
Journal_Title :
Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
1063-8210
Type :
jour
DOI :
10.1109/TVLSI.2009.2020724
Filename :
5208378
Link To Document :
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