Title :
New methodologies for measuring film thickness, coverage, and topography
Author :
Mate, C. Mathew ; Yen, Bing K. ; Miller, Dolores C. ; Toney, Mike F. ; Scarpulla, Mike ; Frommer, Jane E.
Author_Institution :
IBM Almaden Res. Center, San Jose, CA, USA
Abstract :
We describe how the techniques of X-ray reflectivity (XRR), electron spectroscopy for chemical analysis (ESCA), and atomic force microscopy (AFM) can be used to obtain the structural parameters-thickness, coverage, and topography-of thin films used on magnetic recording disks. We focus on ultra-thin amorphous nitrogenated carbon (CNx) overcoats on disks. Each technique has its own strengths: XRR measures film thickness absolutely, ESCA determines the chemical composition of the films, and AFM maps topography accurately. For the CNx overcoats investigated, we find incomplete coverage for thicknesses less than 20 Å, and we find a small surface roughness with rms roughness ≤11 Å.
Keywords :
ESCA; X-ray reflection; atomic force microscopy; carbon compounds; magnetic disc storage; protective coatings; surface topography measurement; thickness measurement; CN; CNx thin film; ESCA; X-ray reflectivity; atomic force microscopy; chemical composition; coverage measurement; magnetic recording disk; structural parameters; surface roughness; thickness measurement; topography measurement; ultrathin amorphous nitrogenated carbon overcoat; Atomic force microscopy; Atomic measurements; Chemical analysis; Electrons; Magnetic films; Optical films; Reflectivity; Spectroscopy; Surfaces; Thickness measurement;
Journal_Title :
Magnetics, IEEE Transactions on