DocumentCode :
1303601
Title :
Mechanism for recoverable power drift in PHEMTs
Author :
Leoni, Robert E., III ; Bao, Jianwen ; Bu, Jiankang ; Du, Xiaohang ; Shirokov, Mikhail S. ; Hwang, James C M
Author_Institution :
Raytheon Co., Andover, MA, USA
Volume :
47
Issue :
3
fYear :
2000
fDate :
3/1/2000 12:00:00 AM
Firstpage :
498
Lastpage :
506
Abstract :
A new degradation mechanism is proposed for output power drift under rf overdrive of pseudomorphic high electron mobility transistors (PHEMT´s). Similar to the previously reported power-slump mechanism, the gradual reduction in output power is caused by a decrease in the peak drain current. However, unlike power slump that is usually associated with permanent damage, in the present case the output power recovers readily once the rf input is interrupted. A possible mechanism for power drift involves charge trapping in the surface passivation layer. The passivation charge relaxes the electrical field in the semiconductor, which in turn increases the occupation of the interface states between the passivation and semiconductor. Measurements of dc and pulsed current-voltage (I-V) characteristics, rf large signal waveforms, deep level transient spectroscopy, light and temperature effects, as well as metal-insulator-metal leakage support this supposition
Keywords :
UHF field effect transistors; deep level transient spectroscopy; electron traps; interface states; leakage currents; microwave field effect transistors; microwave power transistors; passivation; power HEMT; semiconductor device measurement; PHEMTs; charge trapping; deep level transient spectroscopy; degradation mechanism; interface states; metal-insulator-metal leakage; output power drift; peak drain current; pseudomorphic high electron mobility transistors; pulsed current-voltage characteristics; recoverable power drift; rf large signal waveforms; rf overdrive; surface passivation layer; Current measurement; Degradation; Electron mobility; HEMTs; Interface states; MODFETs; PHEMTs; Passivation; Power generation; Pulse measurements;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.824715
Filename :
824715
Link To Document :
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