Title :
Micromachining of diamond film for MEMS applications
Author :
Shibata, Takayuki ; Kitamoto, Yasutaka ; Unno, Kazuya ; Makino, Eiji
Author_Institution :
Dept. of Electron. & Inf. Eng., Hokkaido Univ., Sapporo, Japan
fDate :
3/1/2000 12:00:00 AM
Abstract :
We realized two diamond microdevices: a movable diamond microgripper and a diamond probe for an atomic force microscope (AFM), consisting of a V-shaped diamond cantilever and a pyramidal diamond tip, using a microfabrication technique employing semiconductive chemical-vapor-deposited diamond thin film. The microgripper was fabricated by patterning the diamond thin film onto a sacrificial SiO/sub 2/ layer by selective deposition and releasing the movable parts by sacrificial layer etching. The diamond AFM probe was fabricated by combining selective deposition for patterning a diamond cantilever with a mold technique on an Si substrate for producing a pyramidal diamond tip. The cantilever was then released by removing the substrate. We report the initial results obtained in AFM measurements taken using the fabricated diamond probe. These results indicate that this diamond probe is capable of measuring AFM images. In addition, we have developed the anodic bonding of diamond thin film to glass using Al or Ti film as an intermediate layer for assembly. This bonding technique will allow diamond microstructures to be used in many novel applications for microelectromechanical systems.
Keywords :
CVD coatings; anodisation; atomic force microscopy; chemical vapour deposition; diamond; elemental semiconductors; etching; micromachining; micromanipulators; semiconductor growth; semiconductor thin films; wafer bonding; AFM; Al; C; MEMS applications; SiO/sub 2/; Ti; V-shaped diamond cantilever; anodic bonding; atomic force microscope; diamond film; diamond microdevices; diamond probe; glass; intermediate layer; microelectromechanical systems; microfabrication technique; micromachining; mold technique; movable diamond microgripper; patterning; pyramidal diamond tip; sacrificial SiO/sub 2/ layer; sacrificial layer etching; selective deposition; semiconductive chemical-vapor-deposited diamond thin film; Atomic force microscopy; Atomic layer deposition; Bonding; Grippers; Micromachining; Micromechanical devices; Probes; Semiconductor films; Semiconductor thin films; Substrates;
Journal_Title :
Microelectromechanical Systems, Journal of