• DocumentCode
    1305682
  • Title

    Micromachining of diamond film for MEMS applications

  • Author

    Shibata, Takayuki ; Kitamoto, Yasutaka ; Unno, Kazuya ; Makino, Eiji

  • Author_Institution
    Dept. of Electron. & Inf. Eng., Hokkaido Univ., Sapporo, Japan
  • Volume
    9
  • Issue
    1
  • fYear
    2000
  • fDate
    3/1/2000 12:00:00 AM
  • Firstpage
    47
  • Lastpage
    51
  • Abstract
    We realized two diamond microdevices: a movable diamond microgripper and a diamond probe for an atomic force microscope (AFM), consisting of a V-shaped diamond cantilever and a pyramidal diamond tip, using a microfabrication technique employing semiconductive chemical-vapor-deposited diamond thin film. The microgripper was fabricated by patterning the diamond thin film onto a sacrificial SiO/sub 2/ layer by selective deposition and releasing the movable parts by sacrificial layer etching. The diamond AFM probe was fabricated by combining selective deposition for patterning a diamond cantilever with a mold technique on an Si substrate for producing a pyramidal diamond tip. The cantilever was then released by removing the substrate. We report the initial results obtained in AFM measurements taken using the fabricated diamond probe. These results indicate that this diamond probe is capable of measuring AFM images. In addition, we have developed the anodic bonding of diamond thin film to glass using Al or Ti film as an intermediate layer for assembly. This bonding technique will allow diamond microstructures to be used in many novel applications for microelectromechanical systems.
  • Keywords
    CVD coatings; anodisation; atomic force microscopy; chemical vapour deposition; diamond; elemental semiconductors; etching; micromachining; micromanipulators; semiconductor growth; semiconductor thin films; wafer bonding; AFM; Al; C; MEMS applications; SiO/sub 2/; Ti; V-shaped diamond cantilever; anodic bonding; atomic force microscope; diamond film; diamond microdevices; diamond probe; glass; intermediate layer; microelectromechanical systems; microfabrication technique; micromachining; mold technique; movable diamond microgripper; patterning; pyramidal diamond tip; sacrificial SiO/sub 2/ layer; sacrificial layer etching; selective deposition; semiconductive chemical-vapor-deposited diamond thin film; Atomic force microscopy; Atomic layer deposition; Bonding; Grippers; Micromachining; Micromechanical devices; Probes; Semiconductor films; Semiconductor thin films; Substrates;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/84.825776
  • Filename
    825776