• DocumentCode
    1305750
  • Title

    Micromachined silicon resonant strain gauges fabricated using SOI wafer technology

  • Author

    Beeby, Steve P. ; Ensell, Graham ; Baker, Brian R. ; Tudor, M. John ; White, Neil M.

  • Author_Institution
    Dept. of Electron. & Comput. Sci., Southampton Univ., UK
  • Volume
    9
  • Issue
    1
  • fYear
    2000
  • fDate
    3/1/2000 12:00:00 AM
  • Firstpage
    104
  • Lastpage
    111
  • Abstract
    The optimum mode of double-ended tuning-fork-style resonators is a lateral vibration in the plane of the wafer. Lateral vibrations are typically excited using the comb drive approach, but this requires modification to the resonator structure. This paper reports a simple method for exciting and detecting lateral vibrations without modifying the resonator, thereby enabling the optimum dynamically balanced structure to be used. This approach uses plane electrodes positioned parallel to the resonator´s tines to excite the vibrations while the change in resistance along the length of the resonator enables the vibrations to be detected. Test devices have been fabricated in single-crystal silicon using the buried oxide in silicon-on-insulator wafers as a sacrificial layer. The resonators are 340-/spl mu/m long, 3-/spl mu/m thick with tines 2-/spl mu/m wide. The gap between the tines and the electrode is 2 /spl mu/m. Visual inspection in a scanning electron microscope and electrical tests have confirmed the validity of this approach.
  • Keywords
    buried layers; elemental semiconductors; micromachining; micromechanical resonators; microsensors; scanning electron microscopy; silicon; silicon compounds; silicon-on-insulator; strain gauges; 2 mum; 3 mum; 340 mum; SOI wafer technology; Si-SiO/sub 2/; buried oxide; comb drive approach; double-ended tuning-fork-style resonators; electrical tests; lateral vibration; micromachined silicon resonant strain gauges; optimum dynamically balanced structure; optimum mode; plane electrodes; sacrificial layer; scanning electron microscopy; silicon-on-insulator wafers; single-crystal silicon; Capacitive sensors; Electrodes; Fabrication; Inspection; Mechanical sensors; Micromachining; Resonance; Silicon on insulator technology; Testing; Vibrations;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/84.825784
  • Filename
    825784