DocumentCode
1305750
Title
Micromachined silicon resonant strain gauges fabricated using SOI wafer technology
Author
Beeby, Steve P. ; Ensell, Graham ; Baker, Brian R. ; Tudor, M. John ; White, Neil M.
Author_Institution
Dept. of Electron. & Comput. Sci., Southampton Univ., UK
Volume
9
Issue
1
fYear
2000
fDate
3/1/2000 12:00:00 AM
Firstpage
104
Lastpage
111
Abstract
The optimum mode of double-ended tuning-fork-style resonators is a lateral vibration in the plane of the wafer. Lateral vibrations are typically excited using the comb drive approach, but this requires modification to the resonator structure. This paper reports a simple method for exciting and detecting lateral vibrations without modifying the resonator, thereby enabling the optimum dynamically balanced structure to be used. This approach uses plane electrodes positioned parallel to the resonator´s tines to excite the vibrations while the change in resistance along the length of the resonator enables the vibrations to be detected. Test devices have been fabricated in single-crystal silicon using the buried oxide in silicon-on-insulator wafers as a sacrificial layer. The resonators are 340-/spl mu/m long, 3-/spl mu/m thick with tines 2-/spl mu/m wide. The gap between the tines and the electrode is 2 /spl mu/m. Visual inspection in a scanning electron microscope and electrical tests have confirmed the validity of this approach.
Keywords
buried layers; elemental semiconductors; micromachining; micromechanical resonators; microsensors; scanning electron microscopy; silicon; silicon compounds; silicon-on-insulator; strain gauges; 2 mum; 3 mum; 340 mum; SOI wafer technology; Si-SiO/sub 2/; buried oxide; comb drive approach; double-ended tuning-fork-style resonators; electrical tests; lateral vibration; micromachined silicon resonant strain gauges; optimum dynamically balanced structure; optimum mode; plane electrodes; sacrificial layer; scanning electron microscopy; silicon-on-insulator wafers; single-crystal silicon; Capacitive sensors; Electrodes; Fabrication; Inspection; Mechanical sensors; Micromachining; Resonance; Silicon on insulator technology; Testing; Vibrations;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/84.825784
Filename
825784
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