DocumentCode :
1306380
Title :
Giant isotope effect in hot electron degradation of metal oxide silicon devices
Author :
Hess, Karl ; Kizilyalli, Isik C. ; Lyding, Joseph W.
Author_Institution :
Beckman Inst. for Adv. Sci. & Technol., Illinois Univ., Urbana, IL, USA
Volume :
45
Issue :
2
fYear :
1998
fDate :
2/1/1998 12:00:00 AM
Firstpage :
406
Lastpage :
416
Abstract :
A giant isotope effect of hot electron degradation was found by annealing and passivating integrated circuits of recent complementary metal oxide silicon (CMOS) technology with deuterium instead of hydrogen. In this paper, we summarize our experience and present new results of secondary ion mass spectroscopy that correlate deuterium accumulation with reduced hot electron degradation. We also present a first account of the physical theory of this effect with a view on engineering application and point toward rules of current and voltage scaling as obtained from this theory
Keywords :
CMOS integrated circuits; MOSFET; annealing; deuterium; hot carriers; integrated circuit reliability; isotope effects; passivation; secondary ion mass spectroscopy; semiconductor device reliability; CMOS technology; D; D passivation; MOS devices; Si; annealing; current scaling; deuterium accumulation; giant isotope effect; hot electron degradation; integrated circuits; physical theory; secondary ion mass spectroscopy; voltage scaling; Annealing; CMOS integrated circuits; CMOS technology; Degradation; Deuterium; Electrons; Hydrogen; Integrated circuit technology; Isotopes; Silicon;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.658674
Filename :
658674
Link To Document :
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