DocumentCode :
1306408
Title :
Three-dimensional base distributed effects of long stripe BJT´s: base resistance at DC
Author :
Chuang, Ming-Yeh ; Law, Mark E. ; O, Kenneth
Author_Institution :
Dept. of Electr. & Comput. Eng., Florida Univ., Gainesville, FL, USA
Volume :
45
Issue :
2
fYear :
1998
fDate :
2/1/1998 12:00:00 AM
Firstpage :
439
Lastpage :
446
Abstract :
An analytical model describing the DC voltage and current distributed effects in the polysilicon and intrinsic base regions of long stripe BJTs with double polysilicon technology is presented. It is shown that the bias dependent debiasing effect in the base polysilicon contacts causes an unequal division of base current between two base polysilicon contacts and results in a redistribution of base current in the base regions at different levels of current injection. The base resistance is also modulated by this current re-distribution effect at different biases. The change of base resistance with bias is calculated and the results show the importance of the distributed effects in the base polysilicon region in determining the base resistance
Keywords :
bipolar transistors; current distribution; electric resistance; semiconductor device models; silicon; 3D base distributed effects; DC current distributed effects; DC voltage distributed effects; Si; analytical model; base polysilicon contacts; base resistance; bias dependent debiasing effect; current injection; current redistribution effect; double polysilicon technology; intrinsic base region; long stripe BJT; polysilicon region; three-dimensional distributed effects; Analytical models; Bipolar transistors; Computational modeling; Conductivity; Current distribution; Distributed computing; Proximity effect; Solid modeling; Two dimensional displays; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.658678
Filename :
658678
Link To Document :
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