DocumentCode :
1306438
Title :
Verification of saturation velocity lowering in MOSFET´s inversion layer
Author :
Shigyo, Naoyuki ; Shimane, Takeshi ; Suda, Motomu ; Enda, Toshiyuki ; Fukuda, Sanae
Author_Institution :
Microelectron. Eng. Lab., Toshiba Corp., Yokohama, Japan
Volume :
45
Issue :
2
fYear :
1998
fDate :
2/1/1998 12:00:00 AM
Firstpage :
460
Lastpage :
464
Abstract :
With reduction of the MOSFET´s channel length L, the drain saturation current of MOSFET´s is determined by the saturation velocity vsat in the inversion layer. Hence, the modeling of vsat becomes very important. In this paper, vsat in the inversion layer has been examined by using simulation experiment. New parameter values for vsat model in the inversion layer are proposed. In order to verify the vsat model, the impurity profiles of MOSFET´s are calibrated to fit the threshold voltage Vth-L characteristics. Then, we validate new vsat model by comparing the experiments of ID-VD characteristics of 0.35-μm CMOS with the simulations using the energy transport model (ETM)
Keywords :
MOSFET; electric fields; impurity distribution; inversion layers; semiconductor device models; 0.35 micron; ID-VD characteristics; MOSFET; channel length; drain saturation current; energy transport model; impurity profiles; inversion layer; modeling; saturation velocity lowering; simulation experiment; threshold voltage; vsat model; Capacitance; Electron mobility; Helium; Impurities; MOSFET circuits; Nonuniform electric fields; Optical scattering; Phonons; Semiconductor device modeling; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.658681
Filename :
658681
Link To Document :
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