Author :
Torfs, T. ; Aarts, A.A.A. ; Erismis, M.A. ; Aslam, J. ; Yazicioglu, R.F. ; Seidl, K. ; Herwik, S. ; Ulbert, I. ; Dombovari, B. ; Fiath, R. ; Kerekes, B.P. ; Puers, R. ; Paul, O. ; Ruther, P. ; Van Hoof, C. ; Neves, H.P.
Abstract :
This paper presents multi-electrode arrays for in vivo neural recording applications incorporating the principle of electronic depth control (EDC), i.e., the electronic selection of recording sites along slender probe shafts independently for multiple channels. Two-dimensional (2D) arrays were realized using a commercial 0.5- μm complementary-metal-oxide-semiconductor (CMOS) process for the EDC circuits combined with post-CMOS micromachining to pattern the comb-like probes and the corresponding electrode metallization. A dedicated CMOS integrated front-end circuit was developed for pre-amplification and multiplexing of the neural signals recorded using these probes.
Keywords :
CMOS integrated circuits; bioelectric potentials; biomedical electrodes; iridium compounds; medical control systems; micromachining; multiplexing; neurophysiology; prosthetics; IrO; comblike probes; complementary metal oxide semiconductor process; dedicated CMOS integrated front end circuit; electrode metallization; electronic depth control; electronic recording sites selection; implantation; in vivo neural recording; local field potentials; multielectrode arrays; multiplexing; post CMOS micromachining; preamplification; size 0.5 mum; two dimensional multichannel neural probes; CMOS integrated circuits; Contacts; Electrodes; Impedance; Probes; Shafts; Switches; Complementary-metal-oxide-semiconductor (CMOS) integrated circuits; implantable biomedical devices; multi-electrode arrays; neural probes;
