DocumentCode :
1307749
Title :
Hydrogen passivation of high purity n-type InP
Author :
Lancefield, D. ; Waterhouse, K. ; Adams, A.R. ; Greene, P.D. ; Glew, R.W.
Volume :
26
Issue :
6
fYear :
1990
fDate :
3/15/1990 12:00:00 AM
Firstpage :
369
Lastpage :
371
Abstract :
It has been shown for the first time that the concentration of ionised impurities in n-type InP can be reduced by incorporation of atomic hydrogen. The temperature dependence of the electron mobility indicates that donors as well as acceptors are passivated, although the hydrogen is more strongly bound when passivating acceptors.
Keywords :
Hall effect; III-V semiconductors; carrier density; carrier mobility; electrical conductivity of crystalline semiconductors and insulators; hydrogen; impurity electron states; indium compounds; passivation; Hall mobility; Hall scattering factor; III-V semiconductors; InP:Fe; InP:Fe, H; acceptor passivation; atomic hydrogen; donor passivation; electron mobility; hydrogen passivation; ionised impurity concentration; n-type InP; temperature dependence;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19900241
Filename :
82670
Link To Document :
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