DocumentCode :
1307752
Title :
Charge pumping analysis of radiation effects in LOCOS parasitic transistors
Author :
Flament, O. ; Autran, J.L. ; Paillet, P. ; Roche, P. ; Faynot, O. ; Truche, R.
Author_Institution :
CEA, Centre d´´Etudes de Bruyeres-le-Chatel, France
Volume :
44
Issue :
6
fYear :
1997
fDate :
12/1/1997 12:00:00 AM
Firstpage :
1930
Lastpage :
1938
Abstract :
We have performed current-voltage and charge pumping measurements on LOCOS parasitic transistors submitted to X-ray irradiation. The electrical behavior and the charge pumping response of these non-planar structures have been analyzed by two-dimensional computer simulations. We report how this experimental approach allows us to obtain quantitative information about oxide charge and interface trap densities in different parts of the complete structure. Our results show a maximum of oxide charge trapping and interface trap buildup in the bird´s beak regions after irradiation. The generation of radiation-induced interface and border traps along the LOCOS SiO2/Si interface is discussed, in terms of trap density and frequency response
Keywords :
MOSFET; X-ray effects; electron traps; interface states; isolation technology; oxidation; LOCOS parasitic transistor; SiO2-Si; X-ray irradiation; bird´s beak; border traps; charge pumping analysis; current-voltage measurement; electrical characteristics; frequency response; interface trap density; nonplanar structure; oxide charge trapping; two-dimensional computer simulation; CMOS technology; Charge measurement; Charge pumps; Current measurement; Leakage current; MOSFETs; Oxidation; Performance evaluation; Radiation effects; Silicon;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.658964
Filename :
658964
Link To Document :
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