Title :
Surface-micromachined micro-XYZ stages for free-space microoptical bench
Author :
Lin, Lih Y. ; Shen, J.L. ; Lee, S.S. ; Wu, M.C.
Author_Institution :
Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
fDate :
3/1/1997 12:00:00 AM
Abstract :
Micro-XYZ stages have been monolithically integrated with microactuators and out-of-plane microoptical elements, all fabricated by the same surface-micromachined process, on Si free-space microoptical bench. Optical beam adjustment with three degrees of freedom has been realized without angular squinting. A positioning accuracy of 11 nm has been achieved by the integrated scratch drive actuators, with the travel distance larger than 30 μm in each direction.
Keywords :
integrated optoelectronics; measurement errors; microactuators; micromachining; optical design techniques; optical fabrication; silicon; 30 mum; Si free-space microoptical bench; degrees of freedom; free-space microoptical bench; integrated scratch drive actuators; micro-XYZ stages; microactuators; monolithically integrated; optical beam adjustment; out-of-plane microoptical elements; positioning accuracy; surface-micromachined; surface-micromachined process; travel distance; Actuators; Beam steering; Integrated optics; Lenses; Microactuators; Mirrors; Optical beams; Optical device fabrication; Optical refraction; Optical sensors;
Journal_Title :
Photonics Technology Letters, IEEE
