DocumentCode :
1311371
Title :
Positive temperature coefficient of breakdown voltage in 4H-SiC pn junction rectifiers
Author :
Neudeck, Philip G. ; Fazi, Christian
Author_Institution :
NASA Lewis Res. Center, Cleveland, OH, USA
Volume :
18
Issue :
3
fYear :
1997
fDate :
3/1/1997 12:00:00 AM
Firstpage :
96
Lastpage :
98
Abstract :
It has been suggested that once silicon carbide (SiC) technology overcomes some crystal growth obstacles, superior SiC semiconductor devices would supplant silicon in many high-power applications. However, the property of positive temperature coefficient of breakdown voltage, a behavior crucial to realizing excellent power device reliability, has not been observed in 4H-SiC, which is presently the best-suited SiC polytype for power device implementation. This paper reports the first experimental measurements of stable positive temperature coefficient behavior observed in 4H-SiC pn junction rectifiers. This research indicates that robust 4H-SiC power devices with high breakdown reliability should be achievable after SiC foundries reduce material defects such as micropipes, dislocations, and deep level impurities.
Keywords :
dislocations; electric breakdown; impurities; power semiconductor diodes; semiconductor device reliability; silicon compounds; solid-state rectifiers; wide band gap semiconductors; 4H-SiC p-n junction rectifiers; SiC; breakdown voltage; deep level impurities; dislocations; high breakdown reliability; material defects reduction; micropipes; positive temperature coefficient; power device reliability; stable behavior; Breakdown voltage; Electric breakdown; Impurities; NASA; Power system reliability; Pulse power systems; Rectifiers; Semiconductor diodes; Silicon carbide; Temperature;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.556092
Filename :
556092
Link To Document :
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