Title :
Low-threshold GRIN-SCH AlGaInAs 1.55 mu m quantum well buried ridge structure lasers grown by molecular beam epitaxy
Author :
Kazmierski, C. ; Blez, M. ; Quillec, M. ; Allovon, M. ; Sermage, B.
Author_Institution :
CNET, Bagneux, France
fDate :
6/21/1990 12:00:00 AM
Abstract :
Two-step MBE/MOVPE epitaxy buried ridge stripe GRIN-SCH quantum well lasers having MBE active structure consisting of GaInAs quantum wells and an AlGaInAs continuously graded confinement region have been fabricated and characterised. Devices operating at 1.55 mu m wavelength with a low CW threshold current of 18.7 mA have been demonstrated. This figure is the best result obtained in the AlGaInAs system. A study of the intrinsic optical response of the active layer showed a very fast decay of the resonance oscillations. A good figure of the optical bandwidth move-out rate 3.9 GHz mW-12/ has been observed.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; molecular beam epitaxial growth; semiconductor epitaxial layers; semiconductor growth; semiconductor junction lasers; semiconductor quantum wells; vapour phase epitaxial growth; 1.55 micron; 18.7 mA; GaInAs-AlGaInAs; buried ridge stripe GRIN-SCH quantum well lasers; continuously graded confinement region; fast decay; intrinsic optical response; low CW threshold current; optical bandwidth move-out rate; quantum wells; resonance oscillations; two-step MBE/MOVPE epitaxy;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19900581