DocumentCode
1314395
Title
Restoration mechanisms in highly deformed Cu-based conductor wires
Author
Kalu, P.N. ; Waryoba, D.R. ; van Sciver, S. ; Brandao, L.
Author_Institution
FAMU-FSU Coll. of Eng., NHMFL, Tallahassee, FL, USA
Volume
10
Issue
1
fYear
2000
fDate
3/1/2000 12:00:00 AM
Firstpage
1296
Lastpage
1299
Abstract
Conductor wires used in pulsed magnets are traditionally fabricated by wire drawing. The strength of the conductors is influenced by the microstructure, which is partly dependent on the restoration mechanisms occurring during processing. This study provides an insight into the types of restoration mechanisms occurring during wire drawing of OFHC copper. The effects of the restoration mechanisms on the mechanical and electrical properties of the material were determined. Tensile tests revealed the existence of steady state stress followed by strength softening at large processing strain. Optical and orientation imaging microscopy (OIM) showed that the strength softening coincided with the onset of recrystallization in the material. Although restoration mechanisms of recovery and recrystallization played some role in the strengthening they had little or no effect on the resistivity of the material.
Keywords
copper; crystal microstructure; drawing (mechanical); internal stresses; optical microscopy; recrystallisation; tensile strength; Cu; OFHC copper; highly deformed conductor wires; microstructure; orientation imaging microscopy; pulsed magnets; recrystallization; restoration mechanisms; steady state stress; strength softening; tensile test; wire drawing; Conducting materials; Conductors; Copper; Magnets; Microstructure; Optical materials; Optical microscopy; Softening; Tensile stress; Wire drawing;
fLanguage
English
Journal_Title
Applied Superconductivity, IEEE Transactions on
Publisher
ieee
ISSN
1051-8223
Type
jour
DOI
10.1109/77.828473
Filename
828473
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