DocumentCode :
1314395
Title :
Restoration mechanisms in highly deformed Cu-based conductor wires
Author :
Kalu, P.N. ; Waryoba, D.R. ; van Sciver, S. ; Brandao, L.
Author_Institution :
FAMU-FSU Coll. of Eng., NHMFL, Tallahassee, FL, USA
Volume :
10
Issue :
1
fYear :
2000
fDate :
3/1/2000 12:00:00 AM
Firstpage :
1296
Lastpage :
1299
Abstract :
Conductor wires used in pulsed magnets are traditionally fabricated by wire drawing. The strength of the conductors is influenced by the microstructure, which is partly dependent on the restoration mechanisms occurring during processing. This study provides an insight into the types of restoration mechanisms occurring during wire drawing of OFHC copper. The effects of the restoration mechanisms on the mechanical and electrical properties of the material were determined. Tensile tests revealed the existence of steady state stress followed by strength softening at large processing strain. Optical and orientation imaging microscopy (OIM) showed that the strength softening coincided with the onset of recrystallization in the material. Although restoration mechanisms of recovery and recrystallization played some role in the strengthening they had little or no effect on the resistivity of the material.
Keywords :
copper; crystal microstructure; drawing (mechanical); internal stresses; optical microscopy; recrystallisation; tensile strength; Cu; OFHC copper; highly deformed conductor wires; microstructure; orientation imaging microscopy; pulsed magnets; recrystallization; restoration mechanisms; steady state stress; strength softening; tensile test; wire drawing; Conducting materials; Conductors; Copper; Magnets; Microstructure; Optical materials; Optical microscopy; Softening; Tensile stress; Wire drawing;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/77.828473
Filename :
828473
Link To Document :
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