DocumentCode :
1314565
Title :
Silicon device technology
Author :
Roberts, D.H.
Author_Institution :
The Plessey Company Limited
Volume :
5
Issue :
2
fYear :
1968
Firstpage :
101
Lastpage :
108
Abstract :
Despite the recent gains in silicon integrated circuit technology, further developments are necessary to provide lower costs, increased control capability, improvements in performance, and better overall understanding of the problems and potentials of this burgeoning field. The concept of optimum-scale integration is examined in detail.
Keywords :
Aluminum; Bipolar integrated circuits; Capacitance; Electronics industry; Fabrication; Integrated circuit technology; Isolation technology; Production; Silicon carbide; Silicon devices;
fLanguage :
English
Journal_Title :
Spectrum, IEEE
Publisher :
ieee
ISSN :
0018-9235
Type :
jour
DOI :
10.1109/MSPEC.1968.5214777
Filename :
5214777
Link To Document :
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