Title :
Amplitude mask patterned on an excimer laser mirror for high intensity writing of long period fibre gratings
Author :
Patrick, H.J. ; Askins, C.G. ; McElhanon, R.W. ; Friebele, E.J.
Author_Institution :
Div. of Opt. Sci., Naval Res. Lab., Washington, DC, USA
fDate :
6/19/1997 12:00:00 AM
Abstract :
Masks have been produced for long period fibre grating fabrication from commercial dielectric laser mirrors. The masks, which were produced by direct patterning of a photoresist using an argon laser, can withstand in excess of 200 MJ/cm2 per 15 ns pulse of 248 nm laser light. The use of these masks decreased exposure times by 90%, and nearly doubled the attenuation (dB) of a long period grating produced by a given UV fluence compared to chrome-on-silica masks
Keywords :
diffraction gratings; excimer lasers; laser mirrors; masks; optical fabrication; optical fibres; 15 ns; 248 nm; UV exposure; amplitude mask; argon laser; attenuation; dielectric mirror; direct patterning; excimer laser mirror; fabrication; high intensity writing; period fibre grating; photoresist;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19970780
