Title :
Passive electrical vernier for measuring mask misalignment
Author :
Walton, J. ; Fallon, M. ; Ward, D. ; Holwill, R.J.
Author_Institution :
Inst. of Acoust., Nanjing Univ., China
fDate :
7/19/1990 12:00:00 AM
Abstract :
A passive electrical vernier for the measurement of the misalignment between the layers of integrated circuits is presented. This three layer structure has the same simplicity of processing as analogue structures along with the advantages of digital measurement which make it an attractive alternative for measuring the mask misalignment between layers.
Keywords :
VLSI; displacement measurement; integrated circuit technology; masks; position measurement; digital measurement; layers of integrated circuits; mask misalignment between layers; measuring mask misalignment; passive electrical vernier; three layer structure;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19900759
