Title :
Process Reliability Data Comparison Guidance and Practise in Advanced Semiconductor Manufacturing Quality Control
Author :
Dulin Wang ; Kang, Ren ; Ming Li ; Ma, Jiaxin ; Wu, Junyong ; Chein, Wei-Ting Kary
Author_Institution :
Semicond. Manuf. Int. Corp., Shanghai, China
Abstract :
This paper introduces a guidance, which is displayed by a flow chart, for the process reliability data comparison of advanced semiconductor technologies. The present semiconductor manufacturing process is very complex and its quality control requirement also becomes more and more strict. Different reliability data may analyzed by different methods considering both engineering and statistical evidence so we can best assess process reliability performance not only considering the lifetime requirements. Engineering comparison method is based on fitting the reliability data with proper distribution or lifetime model and comparing the lifetime at a specified condition with 95% confidence band. We apply F-T test for two groups data and one-way ANOVA for multi-groups statistical comparisons. Practical examples are given to illustrate our proposed guidance flow.
Keywords :
quality control; semiconductor device manufacture; semiconductor device reliability; statistical analysis; ANOVA; F-T test; advanced semiconductor manufacturing quality control; engineering comparison method; flow chart; lifetime model; multigroups statistical comparison; process reliability data comparison guidance; statistical evidence; Analysis of variance; Human computer interaction; Process control; Quality control; Reliability engineering; Synthetic aperture sonar; comparison guidance; engineering judgment; quality control; reliability tests; statistic comparison;
Conference_Titel :
Measuring Technology and Mechatronics Automation (ICMTMA), 2014 Sixth International Conference on
Conference_Location :
Zhangjiajie
Print_ISBN :
978-1-4799-3434-8
DOI :
10.1109/ICMTMA.2014.112