• DocumentCode
    1316957
  • Title

    Tunable bandgap opening in the proposed structure of silicon-doped graphene

  • Author

    Azadeh, M.S.S. ; Kokabi, A. ; Hosseini, Mahmood ; Fardmanesh, Mehdi

  • Author_Institution
    Dept. of Electr. Eng., Sharif Univ. of Technol., Tehran, Iran
  • Volume
    6
  • Issue
    8
  • fYear
    2011
  • fDate
    8/1/2011 12:00:00 AM
  • Firstpage
    582
  • Lastpage
    585
  • Abstract
    A specific structure of doped graphene with substituted silicon impurity is introduced and ab initio density-functional approach is applied for the energy band structure calculation of the proposed structure. Using the band structure calculation for different silicon sites in the host graphene, the effect of silicon concentration and unit cell geometry on the bandgap of the proposed structure is also investigated. Chemically, silicon-doped graphene results in an energy gap as large as 2 eV according to density-functional theory calculations. As the authors will show, in contrast to previous bandgap engineering methods, such structure has significant advantages including wide gap tuning capability and its negligible dependency on lattice geometry.
  • Keywords
    ab initio calculations; density functional theory; elemental semiconductors; energy gap; graphene; impurities; narrow band gap semiconductors; semiconductor doping; silicon; tuning; C:Si; ab initio density-functional approach; density functional theory calculations; energy band structure calculation; energy gap; lattice geometry; previous bandgap engineering methods; silicon concentration effect; silicon impurity; silicon-doped graphene structure; tunable bandgap opening; unit cell geometry; wide gap tuning capability;
  • fLanguage
    English
  • Journal_Title
    Micro & Nano Letters, IET
  • Publisher
    iet
  • ISSN
    1750-0443
  • Type

    jour

  • DOI
    10.1049/mnl.2011.0195
  • Filename
    6012991