Title :
Resolution limiting mechanism in electron beam lithography
Author :
Yoshizawa, M. ; Moriya, S.
Author_Institution :
ULSI R&D Labs., Sony Corp., Kanagawa, Japan
fDate :
1/6/2000 12:00:00 AM
Abstract :
The actual mechanism limiting resolution in electron beam lithography is studied experimentally. A higher resolution can be obtained through a smoother pattern edge, which is derived from a steeper beam profile slope at the threshold level. Reducing the beam blur improves the resolution limit because it increases the slope and smooths the pattern edge
Keywords :
electron beam lithography; electron optics; image resolution; beam blur; beam profile slope; electron beam lithography; line edge roughness; pattern edge smoothness; resolution limit; resolution limiting mechanism; threshold level;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20000144
