DocumentCode :
1318340
Title :
Measurement of field-induced refractive index variation in GaAs/AlGaAs superlattice using monolithic Fabry-Perot etalon
Author :
Law, K. -K ; Yan, R.H. ; Coldren, L.A. ; Merz, J.L.
Author_Institution :
Dept. of Electr. Comput. Eng., California Univ., Santa Barbara, CA, USA
Volume :
27
Issue :
2
fYear :
1991
Firstpage :
105
Lastpage :
106
Abstract :
The electrorefractive effect in a GaAs/AlGaAs superlattice was measured by using a monolithic Fabry-Perot structure, where the superlattice active region is embedded inside a cavity, formed by two quarter-wave stacks, all grown by molecular beam epitaxy. At the wavelength approximately 7675 AA, there is a large absorption change ( approximately 5400/cm) and an accompanying index change ( approximately 0.015) when the applied field change is approximately 100 kV/cm. In addition, the chirp parameter at this wavelength is less than 1. This result shows that superlattice electroabsorption optical modulation can offer relatively very low chirp.
Keywords :
III-V semiconductors; aluminium compounds; electroabsorption; gallium arsenide; optical modulation; refractive index measurement; semiconductor superlattices; GaAs-AlGaAs; MBE; cavity; chirp parameter; electro-optical effect; electrorefractive effect; field-induced refractive index variation; molecular beam epitaxy; monolithic Fabry-Perot etalon; quarter-wave stacks; superlattice active region; superlattice electroabsorption optical modulation;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19910070
Filename :
83146
Link To Document :
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