Title :
Moire phase masks for automatic pure apodisation of fibre Bragg gratings
Author :
Albert, J. ; Hill, K.O. ; Johnson, D.C. ; Bilodeau, F. ; Rooks, M.J.
Author_Institution :
Communication Res. Centre, Ottawa, Ont., Canada
fDate :
11/21/1996 12:00:00 AM
Abstract :
A Moire technique is used in the fabrication of a diffractive phase mask by electron beam lithography. The phase mask has a varying diffraction efficiency designed to produce apodised fibre Bragg gratings with a uniform ultraviolet beam exposure. Since the illumination is uniform, the average induced refractive index is constant along the grating and pure apodisation results
Keywords :
moire fringes; Moire phase masks; automatic pure apodisation; average induced refractive index; diffraction efficiency; diffractive phase mask; electron beam lithography; fibre Bragg gratings; ultraviolet beam exposure;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19961469
