• DocumentCode
    1318818
  • Title

    Electron spin resonance characterization of trapping centers in Unibond buried oxides

  • Author

    Conley, J.F., Jr. ; Lenahan, P.M. ; Wallace, B.D.

  • Author_Institution
    Commercial Syst., Dynamics Res. Corp., Beaverton, OR, USA
  • Volume
    43
  • Issue
    6
  • fYear
    1996
  • fDate
    12/1/1996 12:00:00 AM
  • Firstpage
    2635
  • Lastpage
    2638
  • Abstract
    Electron spin resonance and capacitance vs. voltage measurements are used to evaluate the radiation response of Unibond buried oxides. When damaged by hole injection, it is found that Unibond buried oxides exhibit a rough correspondence between E´ centers and positive charge as well as generation of Pb centers at the Unibond buried oxide/Si interface. In these respects, Unibond buried oxides qualitatively resemble thermal SiO2. However, a hydrogen complexed E´ center known as the 74 G doublet is also detected in the Unibond buried oxides. This defect is not detectable in thermal SiO2 under similar circumstances. Since the presence of 74 G doublet center is generally indicative of very high hydrogen content and since hydrogen is clearly a significant participant in radiation damage, this result suggests a qualitative difference between the radiation response of Unibond and thermal SiO2. Unibond results are also compared and contrasted with similar investigations on separation-by-implanted-oxygen (SIMOX) buried oxides. Although the charge trapping response of Unibond buried oxides may be inferior to that of radiation hardened thermal SiO2, it appears to be more simple and superior to that of SIMOX buried oxides
  • Keywords
    buried layers; hole traps; paramagnetic resonance; radiation hardening (electronics); silicon-on-insulator; 74 G doublet; E´ centers; Pb centers; SOI; Si-SiO2; Unibond buried oxide; capacitance voltage characteristics; electron spin resonance; hole injection; hydrogen complex; positive charge; radiation damage; trapping centers; Annealing; Capacitance; Electron traps; Etching; Hydrogen; Implants; Paramagnetic resonance; Silicon on insulator technology; Temperature; Wafer bonding;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.556846
  • Filename
    556846