DocumentCode
1319032
Title
First microwave characterisation of LP-MOCVD grown GaInP/GaAs self-aligned HBT
Author
Delage, S.L. ; di Forte-Poisson, M.A. ; Blanck, H. ; Brylinski, Christian ; Chartier, E. ; Collot, P.
Author_Institution
Thomson-CSF/LCR, Domaine de Corbeville, Orsay, France
Volume
27
Issue
3
fYear
1991
Firstpage
253
Lastpage
254
Abstract
The microwave characterisation of GaInP/GaAs HBTs is reported. The structures are grown by LP-MOCVD, and carbon base doping is used. The transistor design is basically multimesas and the devices are obtained using a combination of dry and wet etching. The current and power gain cutoff frequencies of these devices are, respectively, 30 GHz and 45 GHz.
Keywords
III-V semiconductors; chemical vapour deposition; gallium arsenide; heterojunction bipolar transistors; indium compounds; semiconductor technology; solid-state microwave devices; vapour phase epitaxial growth; 30 GHz; 45 GHz; GaAs:C; GaInP-GaAs; LP-MOCVD; current gain cutoff frequency; low pressure MOCVD; microwave characterisation; multimesas; power gain cutoff frequencies; self-aligned HBT; semiconductors; transistor design; wet etching;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19910163
Filename
83241
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