DocumentCode :
1319210
Title :
A physical interpretation for the single-event-gate-rupture cross-section of n-channel power MOSFETs
Author :
Johnson, G.H. ; Galloway, K.F. ; Schrimpf, R.D. ; Titus, J.L. ; Wheatley, C.F. ; Allenspach, M. ; Dachs, C.
Author_Institution :
Arizona Univ., Tucson, AZ, USA
Volume :
43
Issue :
6
fYear :
1996
fDate :
12/1/1996 12:00:00 AM
Firstpage :
2932
Lastpage :
2937
Abstract :
The single-event-gate-rupture cross-section is measured as a function of drain-source and gate-source bias for some n-channel power MOSFETs. The experimental techniques are explained, and the results are interpreted with the help of two-dimensional computer modeling
Keywords :
ion beam effects; power MOSFET; n-channel power MOSFET; single-event-gate-rupture cross-section; two-dimensional computer model; Charge carrier processes; Cranes; Electrodes; FETs; Ion beams; MOSFETs; Neck; Numerical simulation; Power transistors; Silicon;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.556888
Filename :
556888
Link To Document :
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