DocumentCode
1319459
Title
Modeling ionizing radiation induced gain degradation of the lateral PNP bipolar junction transistor
Author
Schmidt, D.M. ; Wu, Aimin ; Schrimpf, R.D. ; Fleetwood, D.M. ; Pease, R.L.
Author_Institution
Dept. of Electr. & Comput. Eng., Arizona Univ., Tucson, AZ, USA
Volume
43
Issue
6
fYear
1996
fDate
12/1/1996 12:00:00 AM
Firstpage
3032
Lastpage
3039
Abstract
Ionizing-radiation-induced gain degradation in lateral PNP bipolar junction transistors is due to an increase in base current as a result of recombination at the surface of the device. A qualitative model is presented which identifies the physical mechanism responsible for excess base current. The increase in surface recombination velocity due to interface traps results in an increase in excess base current and the positive oxide charge moderates the increase in excess base current and changes the slope of the current-voltage characteristics. Analytical and empirical models have been developed to quantitatively describe the excess base current response to ionizing radiation. It is shown that the surface recombination velocity dominates the excess base current response to total dose
Keywords
X-ray effects; bipolar transistors; characteristics measurement; electron traps; semiconductor device models; surface recombination; base current; current-voltage characteristics; induced gain degradation; interface traps; ionizing radiation effects; lateral PNP bipolar junction transistor; physical mechanism; recombination velocity; surface recombination; total dose; Analog integrated circuits; Application specific integrated circuits; Bipolar integrated circuits; Current-voltage characteristics; Degradation; Doping; Geometry; Ionizing radiation; Laboratories; Numerical simulation;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/23.556902
Filename
556902
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