DocumentCode :
1319768
Title :
Double-Channel AlGaN/GaN High Electron Mobility Transistor With Back Barriers
Author :
Kamath, A. ; Patil, T. ; Adari, R. ; Bhattacharya, I. ; Ganguly, S. ; Aldhaheri, R.W. ; Hussain, M.A. ; Saha, Dipankar
Author_Institution :
Electr. Eng. Dept., IIT Bombay, Mumbai, India
Volume :
33
Issue :
12
fYear :
2012
Firstpage :
1690
Lastpage :
1692
Abstract :
We have developed a double-channel high electron mobility transistor with back barriers for carrier confinement. We have observed that the double-channel devices may suffer from the lack of gate control particularly for the lower channel. However, the problem can be contained by using a suitable back barrier for the lower channel. The double-channel back-barrier devices show good current gain and power gain cutoff frequencies. These devices can be operated with excellent gain linearity up to a larger value for input power and frequency.
Keywords :
aluminium compounds; gallium compounds; high electron mobility transistors; insulated gate field effect transistors; AlGaN-GaN; back barrier; carrier confinement; current gain cutoff frequency; double-channel device; double-channel high electron mobility transistor; gate control; power gain cutoff frequency; Aluminum gallium nitride; Carrier confinement; Cutoff frequency; Gallium nitride; HEMTs; Transconductance; Back barrier; GaN; high electron mobility (HEMT); two-dimensional electron gas (2DEG);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2012.2218272
Filename :
6332471
Link To Document :
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