• DocumentCode
    1319768
  • Title

    Double-Channel AlGaN/GaN High Electron Mobility Transistor With Back Barriers

  • Author

    Kamath, A. ; Patil, T. ; Adari, R. ; Bhattacharya, I. ; Ganguly, S. ; Aldhaheri, R.W. ; Hussain, M.A. ; Saha, Dipankar

  • Author_Institution
    Electr. Eng. Dept., IIT Bombay, Mumbai, India
  • Volume
    33
  • Issue
    12
  • fYear
    2012
  • Firstpage
    1690
  • Lastpage
    1692
  • Abstract
    We have developed a double-channel high electron mobility transistor with back barriers for carrier confinement. We have observed that the double-channel devices may suffer from the lack of gate control particularly for the lower channel. However, the problem can be contained by using a suitable back barrier for the lower channel. The double-channel back-barrier devices show good current gain and power gain cutoff frequencies. These devices can be operated with excellent gain linearity up to a larger value for input power and frequency.
  • Keywords
    aluminium compounds; gallium compounds; high electron mobility transistors; insulated gate field effect transistors; AlGaN-GaN; back barrier; carrier confinement; current gain cutoff frequency; double-channel device; double-channel high electron mobility transistor; gate control; power gain cutoff frequency; Aluminum gallium nitride; Carrier confinement; Cutoff frequency; Gallium nitride; HEMTs; Transconductance; Back barrier; GaN; high electron mobility (HEMT); two-dimensional electron gas (2DEG);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2012.2218272
  • Filename
    6332471