• DocumentCode
    1319856
  • Title

    Comparing MOS and bipolar integrated circuits

  • Author

    Warner, R.M., Jr.

  • Author_Institution
    Texas Instruments Incorporated
  • Volume
    4
  • Issue
    6
  • fYear
    1967
  • fDate
    6/1/1967 12:00:00 AM
  • Firstpage
    50
  • Lastpage
    58
  • Abstract
    In terms of speed and speed/power performance, bipolar integrated circuits are superior to metal-oxide-semiconductor integrated circuits. This superiority is based on the high transconductance inherent in bipolar transistors and is technology-independent. For the MOS case, transconductance is highly technology-dependent, and hence the performance difference will probably diminish in the future. Comparisons of the two technologies in their mid-1966 forms are made; the bipolar performance advantage in most cases is between 10 and 100. MOS integrated circuits have an area-per-function advantage ratio of about 5 for equivalent-function circuits, but a ratio of between 5 and 10 when circuits exploiting the unique MOS properties are considered. In addition, MOS processing is simpler than bipolar processing by approximately 40 percent.
  • Keywords
    Bipolar integrated circuits; Costs; Delay effects; Instruments; Integrated circuit technology; MOS integrated circuits; MOSFET circuits; Parasitic capacitance; Transconductance; Veins;
  • fLanguage
    English
  • Journal_Title
    Spectrum, IEEE
  • Publisher
    ieee
  • ISSN
    0018-9235
  • Type

    jour

  • DOI
    10.1109/MSPEC.1967.5215804
  • Filename
    5215804