• DocumentCode
    1320862
  • Title

    Effect of argon plasma treatment on conductivity of sol-gel fabricated Sb-doped SnO2 thin films

  • Author

    Kololuoma, T. ; Rantala, J.T.

  • Author_Institution
    VTT Electron., Oulu, Finland
  • Volume
    36
  • Issue
    2
  • fYear
    2000
  • fDate
    1/20/2000 12:00:00 AM
  • Firstpage
    172
  • Lastpage
    173
  • Abstract
    The sol-gel method is applied to the fabrication of antimony-doped tin dioxide thin films using SnCl4H2O and SbCl3 precursors. The effect of argon plasma treatment on the spin on fabricated thin films is studied as a function of the plasma treatment time. Changes in electrical conductivity are measured by a linear four-point probe method. The maximum increase in electrical conductivity is found to be 290%, from 138 to 400 S/cm. And the argon plasma reaction response time for the conductivity increase is fast. Finally, the reasons and mechanism for the noticeable resistivity decrease are discussed
  • Keywords
    antimony; electrical conductivity; plasma materials processing; semiconductor growth; semiconductor thin films; sol-gel processing; tin compounds; wide band gap semiconductors; Ar; SnO2:Sb; antimony-doped tin dioxide thin film; argon plasma treatment; electrical conductivity; sol-gel fabrication;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20000174
  • Filename
    833168