DocumentCode
1320862
Title
Effect of argon plasma treatment on conductivity of sol-gel fabricated Sb-doped SnO2 thin films
Author
Kololuoma, T. ; Rantala, J.T.
Author_Institution
VTT Electron., Oulu, Finland
Volume
36
Issue
2
fYear
2000
fDate
1/20/2000 12:00:00 AM
Firstpage
172
Lastpage
173
Abstract
The sol-gel method is applied to the fabrication of antimony-doped tin dioxide thin films using SnCl4H2O and SbCl3 precursors. The effect of argon plasma treatment on the spin on fabricated thin films is studied as a function of the plasma treatment time. Changes in electrical conductivity are measured by a linear four-point probe method. The maximum increase in electrical conductivity is found to be 290%, from 138 to 400 S/cm. And the argon plasma reaction response time for the conductivity increase is fast. Finally, the reasons and mechanism for the noticeable resistivity decrease are discussed
Keywords
antimony; electrical conductivity; plasma materials processing; semiconductor growth; semiconductor thin films; sol-gel processing; tin compounds; wide band gap semiconductors; Ar; SnO2:Sb; antimony-doped tin dioxide thin film; argon plasma treatment; electrical conductivity; sol-gel fabrication;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20000174
Filename
833168
Link To Document