Title :
Anomalous Magnetization Behavior of Fe-N Films Deposited by Reactive Pulsed Laser Deposition
Author :
Li, Jing ; Jiang, Yinzhu ; Ma, Tianyu ; Yang, Deren ; Yan, Mi
Author_Institution :
Dept. of Mater. Sci. & Eng., Zhejiang Univ., Hangzhou, China
Abstract :
A series of Fe-N films with thickness of 200 nm have been prepared by reactive pulsed laser deposition (PLD) at 25°C and at 150°C in various nitrogen pressures. Both series of samples consist of mixtures of γ´-Fe 4N and α-Fe phase. The amount of α-Fe decreases with the increase of nitrogen pressure. Higher remnant ratio and lower coercivity are observed for the films deposited at 150°C compared to the films deposited at 25°C. An anomalously large magnetization is observed for both series of films deposited at a nitrogen pressure of 8 mTorr. The average magnetization is as high as or even larger than that of α-Fe. Conversion electron Mössbauer spectroscopy demonstrated that the highest-magnetization film consists mixtures of γ´-Fe4N and α-Fe phase at a mole ratio of 1:6. The origin of this intriguing high moment is ascribed to a certain lattice constant of the α-Fe which is in a heterogeneous state with γ´-Fe4N for films deposited at a certain nitrogen pressure.
Keywords :
Mossbauer effect; coercive force; iron compounds; lattice constants; magnetic moments; magnetic thin films; mixtures; pulsed laser deposition; remanence; FeN; anomalous magnetization behavior; coercivity; conversion electron Mossbauer spectroscopy; heterogeneous state; lattice constant; magnetic moment; mixtures; nitrogen pressure; pressure 8 mtorr; reactive pulsed laser deposition; remnant ratio; size 200 nm; temperature 150 degC; temperature 25 degC; thin films; Iron; Lattices; Magnetization; Nitrogen; Pulsed laser deposition; Silicon; Temperature measurement; Anomalously giant moment; Fe-N films; nitrogen pressures; pulsed laser deposition;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2012.2200463