DocumentCode
1322835
Title
Position Control in Lithographic Equipment [Applications of Control]
Author
Butler, Hans
Volume
31
Issue
5
fYear
2011
Firstpage
28
Lastpage
47
Abstract
This article describes the basic optical principles in the lithographic tool, with the resulting positioning accuracy requirements. For three generations of lithographic tools, the mechatronic architecture and control implications are discussed. Then, six degrees of freedom (DOF) stage control is described with the main focus on actuator force decoupling, allowing the use of classical single-input, single-output (SISO) controllers.
Keywords
actuators; integrated circuit manufacture; machine tools; mechatronics; photolithography; position control; SISO controller; actuator force decoupling; chip manufacturing; chip manufacturing industry; integrated circuit manufacture; lithographic equipment; lithographic tool; mechatronic architecture; position control; positioning accuracy requirement; single-input single-output controller; stage control; Integrated circuit manufacture; Lithography; Position control; Substrates; Wafer level packaging;
fLanguage
English
Journal_Title
Control Systems, IEEE
Publisher
ieee
ISSN
1066-033X
Type
jour
DOI
10.1109/MCS.2011.941882
Filename
6021296
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