DocumentCode :
1322869
Title :
Integrated RF On-Chip Inductors With Patterned Co-Zr-Ta-B Films
Author :
Wu, Hao ; Gardner, Donald S. ; Xu, Wei ; Yu, Hongbin
Author_Institution :
Ira A. Fulton Schools of Eng., Arizona State Univ., Tempe, AZ, USA
Volume :
48
Issue :
11
fYear :
2012
Firstpage :
4123
Lastpage :
4126
Abstract :
Integrated on-chip inductors with boron-incorporated amorphous Co-Zr-Ta-B films for reducing the size of the inductor and increasing the quality factor are presented. A 3.5-fold increase in inductance and a 3.9-fold increase in quality factor over inductors without magnetic films are measured at frequencies as high as 1 GHz. The Co-Zr-Ta-B films are patterned into the shape of fingers in the magnetic via region to improve the on-chip inductors, high frequency response. Compared with nonpatterned films, finger-shaped magnetic vias result in at least a 30% increase in quality factor in the gigahertz range. It is also demonstrated that by using laminations, an up to 9.1X inductance increase with good frequency response up to 2 GHz can be achieved.
Keywords :
amorphous magnetic materials; cobalt compounds; inductors; laminations; tantalum compounds; thin films; zirconium compounds; CoZrTaB; amorphous Co-Zr-Ta-B film; finger-shaped magnetic vias; inductance; integrated RF; lamination; nonpatterned film; on-chip inductor; quality factor; Amorphous magnetic materials; Inductors; Magnetic resonance; Magnetic separation; Perpendicular magnetic anisotropy; System-on-a-chip; Co-Zr-Ta-B; magnetic thin film; on-chip inductors;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2012.2198448
Filename :
6333023
Link To Document :
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