DocumentCode :
1324533
Title :
Sub-micron camera for interdigital transducer fabrication
Author :
Gregoris, D. ; Ristic, V.M.
Author_Institution :
Dept. of Electr. Eng., Toronto Univ., Ont., Canada
Volume :
10
Issue :
1
fYear :
1985
Firstpage :
46
Lastpage :
48
Abstract :
Describes the structure and operation of a submicron resolution camera system for fabricating high frequency interdigital electrode transducers (IDTs). A high resolution, 10× reduction lens is central to the system which produces IDTs by direct optical projection lithography. The camera resolution was determined experimentally to be approximately 0.75 μm. The system was subsequently used to fabricate a modified chirp transducer with linewidths ranging from 1 μm to 2.4 μm.
Keywords :
cameras; photolithography; transducers; SAW; interdigital electrode transducers; interdigital transducer fabrication; modified chirp transducer; optical projection lithography; photolithography camera; reduction lens; submicron resolution camera; Cameras; Electrodes; Fabrication; Optical filters; Optical surface waves; Substrates; Transducers;
fLanguage :
English
Journal_Title :
Electrical Engineering Journal, Canadian
Publisher :
ieee
ISSN :
0700-9216
Type :
jour
DOI :
10.1109/CEEJ.1985.6593138
Filename :
6593138
Link To Document :
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