Title :
Novel fabrication method of 120 nm period gratings using ECR-CVD SiNx films
Author :
Sugimoto, H. ; Abe, Y. ; Matsui, T. ; Ogata, H.
Author_Institution :
Central Res. Lab., Mitsubishi Electr. Corp., Hyogo, Japan
fDate :
7/7/1988 12:00:00 AM
Abstract :
120 nm period gratings were fabricated by a novel method using ECR-CVD SiNx films. SiNx films deposited on photoresist have a higher etching rate than that on the flat semiconductor substrate. Good use of this difference was made to fabricate gratings whose period is one-half that of the original, formed by a holographic exposure technique
Keywords :
chemical vapour deposition; diffraction gratings; distributed feedback lasers; etching; silicon compounds; 120 nm; CVD; ECR; SiNx films; etching rate; fabrication method; gratings; holographic exposure technique; photoresist;
Journal_Title :
Electronics Letters
