Title :
A model for the temperature-dependent saturated ID -VD characteristics of an a-Si:H thin-film transistor
Author :
Lee, Woo-Sun ; Neudeck, Gerold W. ; Choi, Jongsun ; Luan, Shengwen
Author_Institution :
Sch. of Electr. Eng., Purdue Univ., West Lafayette, IN, USA
fDate :
9/1/1991 12:00:00 AM
Abstract :
A simplified analytical expression for the temperature dependent saturated ID-VD characteristics of hydrogenated amorphous silicon (a-Si:H) thin-film transistors, between -50°C and 90°C, is presented and experimentally verified. The results show that the experimental transfer and output characteristics at several temperatures are easily modeled by a single equation. The model is based on three functions obtained from the experimental data of ID versus VG, over a range of temperature. Theoretical results confirm the simple form of the model in terms of the device geometry. As the temperature increased, the saturated drain current increased and, at a fixed gate voltage the device saturated at increasingly larger drain voltages while the threshold voltage decreased. Good agreement between the measured data and the model was obtained up to 363 K. Also observed at temperatures larger than 363 K was a decrease in ID and more severe gate voltage hysteresis characteristics
Keywords :
amorphous semiconductors; elemental semiconductors; hydrogen; insulated gate field effect transistors; silicon; thin film transistors; -50 to 90 degC; Si:H; TFT; amorphous semiconductor; drain voltages; gate voltage hysteresis characteristics; model; saturated ID-VD characteristics; saturated drain current; temperature dependent characteristics; thin-film transistor; threshold voltage; Amorphous silicon; Hysteresis; Liquid crystal displays; Logic circuits; MOS integrated circuits; Substrates; Temperature distribution; Thin film circuits; Thin film transistors; Threshold voltage;
Journal_Title :
Electron Devices, IEEE Transactions on
