DocumentCode
1325315
Title
Neutron-Induced Charge Collection Simulation of Bulk FinFET SRAMs Compared With Conventional Planar SRAMs
Author
Fang, Yi-Pin ; Oates, Anthony S.
Author_Institution
Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan
Volume
11
Issue
4
fYear
2011
Firstpage
551
Lastpage
554
Abstract
The relative neutron-induced soft-error rate (SER) of bulk FinFET SRAMs compared to planar SRAMs is estimated based on drain area, collected charge, and critical charge using mixed-mode 3-D TCAD simulations. The critical charges of the bulk FinFET and planar devices are comparable, with identical gate length, gate width, and gate oxide thickness. However, the charges collected by the bulk FinFET drain due to ion strikes are smaller than those by the planar FET drain. Bulk FinFETs are anticipated to exhibit lower SER sensitivity compared to planar FETs.
Keywords
SRAM chips; radiation hardening (electronics); technology CAD (electronics); bulk FinFET SRAM; conventional planar SRAM; mixed mode 3D TCAD simulations; neutron induced charge collection simulation; neutron induced soft error rate; FinFETs; Logic gates; Neutrons; Random access memory; Substrates; Transient analysis; Charge collection; neutron-induced single-event upset (SEU); single-event transient; soft-error rate (SER);
fLanguage
English
Journal_Title
Device and Materials Reliability, IEEE Transactions on
Publisher
ieee
ISSN
1530-4388
Type
jour
DOI
10.1109/TDMR.2011.2168959
Filename
6024447
Link To Document