DocumentCode :
1325776
Title :
Ferroelectric sources and their application to pulsed power: a review
Author :
Fleddermann, Charles B. ; Nation, John A.
Author_Institution :
Dept. of Electr. & Comput. Eng., New Mexico Univ., Albuquerque, NM, USA
Volume :
25
Issue :
2
fYear :
1997
fDate :
4/1/1997 12:00:00 AM
Firstpage :
212
Lastpage :
220
Abstract :
We present in this review an account of recent research into the use of ferroelectrics as electron beam sources for pulsed power applications. The work is reviewed according to the ferroelectric material used and the switching process employed. Most of the current research uses PLZT or PZT, which can be ferroelectric, antiferroelectric, or paraelectric depending on the stoichiometry. Switching is accomplished by the application of a fast-rising electric field to the ferroelectric material. The most commonly used materials are PLZT 2/95/5 and PLZT 8/65/35 or PZT (with no lanthanum): in the former case, the applied field switches the material from the antiferroelectric state to the ferroelectric state, and in the latter cases, around a hysteresis loop. Results have been reported with ferroelectric cathodes where current densities of up to a few hundred amperes per square centimeter have been achieved, with pulse durations of several microseconds. With shorter duration pulses and PLZT cathodes, repetition rates of up to 2 MHz have been achieved. In this paper, we focus on the results reported in the literature, and include a brief account of the physical interpretation of the data. The possible use of ferroelectric sources for pulsed power applications is indicated
Keywords :
electron emission; electron sources; ferroelectric devices; ferroelectric thin films; photoemissive devices; pulsed power technology; reviews; stoichiometry; PLZT; PZT; PbLaZrO3TiO3; PbZrO3TiO3; antiferroelectric state to ferroelectric state switching; current densities; electron beam sources; electron emitters; equipotential distribution; fast-rising electric field; ferroelectric cathodes; ferroelectric material; ferroelectric sources; ferroelectric thin films; hysteresis loop; laser irradiation; photoelectron emission; pulse durations; pulse repetition rates; pulsed power applications; stoichiometry; Cathodes; Current density; Electron beams; Electron guns; Ferroelectric materials; Plasma applications; Plasma density; Plasma measurements; Plasma sources; Switches;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.602493
Filename :
602493
Link To Document :
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