DocumentCode :
1325816
Title :
Pulsed intense electron beams generated in transient hollow cathode discharges: fundamentals and applications
Author :
Dewald, Eduard ; Frank, Klaus ; Hoffmann, Dieter H H ; Stark, Robert ; Ganciu, Mihai ; Mandache, Bogdan N. ; Nistor, Magdalena G. ; Pointu, Anne-Marie ; Popescu, Ioan-Iovitz
Author_Institution :
Dept. of Phys., Erlangen-Nurnberg Univ., Germany
Volume :
25
Issue :
2
fYear :
1997
fDate :
4/1/1997 12:00:00 AM
Firstpage :
272
Lastpage :
278
Abstract :
For the commercial application of pulsed power, material processing with intense pulsed particle beams is a very interesting subject. Recently, high-voltage (1-70 kV), low-pressure (1-100 Pa) transient hollow-cathode discharges turned out to be sources for pulsed intense electron beam generation suitable for this application. The remarkable parameters of these electron beams-beam currents of 50-1000 A (10-30% of the maximum discharge current) with a high energy component (mean energy of about 0.25-0.75 of maximum applied voltage) of 20-70% of the maximum beam current, power density up to 10 W/cm2, beam diameters of 0.1-3 mm, beam charge efficiency of 3-5%-captured the attention not only of the scientific community in the last decade. The electron beam is emitted during the early phases of the discharge, and only weak dependence of the high energetic peak of the beam current was found on the external capacity, which determine the development of the later high-current phases. However, the beam parameters depend on the breakdown voltage, gas pressure, and discharge geometry (including self-capacity). In this paper, the characteristics of the pulsed intense electron beams generated in two configurations-multigap pseudosparks and preionization-controlled open-ended hollow-cathode transient discharges (PCOHC)-are described. Such electron beams already were used successfully in a variety of pulsed power applications in material processing, deposition of superconducting (YBaCuO) and diamond-like thin films, microlithography, electron sources for accelerators, and intense point-like X-ray sources, and some preliminary experiments revealed new potential applications such as pumping of short-wavelength laser active media. These pulsed electron beams could be used further in any kind of pulsed power applications that require high-power density, small or high electron energy, and small-beam diameters
Keywords :
electron beam applications; electron beam deposition; electron beam lithography; electron beams; glow discharges; plasma applications; pulsed power technology; sparks; accelerator electron sources; applications; beam charge efficiency; beam parameters; breakdown voltage; deposition; diamond-like thin films; discharge geometry; external capacity; fundamentals; gas pressure; high-current phases; high-power density; intense point-like X-ray sources; intense pulsed particle beams; maximum beam current; microlithography; multigap pseudosparks; potential applications; power density; preionization-controlled open-ended hollow-cathode transient discharges; pulsed intense electron beams generation; pulsed power applications; pulsed power material processing; superconducting YBaCuO; transient hollow cathode discharges; Cathodes; Electron beams; Fault location; Geometry; Materials processing; Particle beams; Pulse generation; Pulsed laser deposition; Voltage; X-ray lasers;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.602499
Filename :
602499
Link To Document :
بازگشت