Title :
Fabrication and characterization of truly 3-D diffuser/nozzle microstructures in silicon
Author :
Heschel, M. ; Müllenborn, M. ; Bouwstra, S.
Author_Institution :
Mikroelektronik Centret, Lyngby, Denmark
fDate :
3/1/1997 12:00:00 AM
Abstract :
We present microfabrication and characterization of truly three-dimensional (3-D) diffuser/nozzle structures in silicon. Chemical vapor deposition (CVD), reactive ion etching (RIE), and laser-assisted etching are used to etch flow chambers and diffuser/nozzle elements. The flow behavior of the fabricated elements and the dependence of diffuser/nozzle efficiency on structure geometry has been investigated. The large freedom of 3-D micromachining combined with rapid prototyping allows one to characterize and optimize diffuser/nozzle structures
Keywords :
Poiseuille flow; chemical vapour deposition; diffusion; elemental semiconductors; flow; laser beam etching; micromachining; micromechanical devices; nozzles; silicon; sputter etching; 3D diffuser/nozzle microstructure; 3D micromachining; CVD; RIE; Si; characterization; chemical vapor deposition; diffuser/nozzle element etching; flow behavior; flow chamber etching; laser-assisted etching; microfabrication; rapid prototyping; reactive ion etching; structure geometry; Chemical elements; Chemical lasers; Chemical vapor deposition; Etching; Fabrication; Geometrical optics; Micromachining; Microstructure; Pumps; Silicon;
Journal_Title :
Microelectromechanical Systems, Journal of
