• DocumentCode
    1326356
  • Title

    An analytic saturation model for drain and substrate currents of conventional and LDD MOSFETs

  • Author

    Huang, Gwo-Sheng ; Wu, Ching-Yuan

  • Author_Institution
    Inst. of Electron., Nat. Chiao-Tung Univ., Hsin-Chu, Taiwan
  • Volume
    37
  • Issue
    7
  • fYear
    1990
  • fDate
    7/1/1990 12:00:00 AM
  • Firstpage
    1667
  • Lastpage
    1677
  • Abstract
    An analytic saturation model for conventional and lightly doped drain (LDD) MOSFETs is developed by using the pseudo-two-dimensional approximation in the channel and drain regions to obtain both the channel length modulation factor and the maximum electric field. Using the established I-V model in the linear region, the drain currents of conventional and LDD MOSFETs can be explicitly calculated. The substrate currents of conventional/LDD MOSFETs are calculated by using an existing simplified substrate current formula and the maximum electric field model. It is shown that the accuracy of the maximum electric field is acceptable for calculating the substrate currents of conventional/LDD MOSFETs. The parameters used in the model can be determined by the existing extraction methods and the optimization technique. The saturation model is shown to be valid for a wide range of channel lengths and bias conditions
  • Keywords
    electric fields; insulated gate field effect transistors; semiconductor device models; I-V model; LDD; MOSFETs; analytic saturation model; bias conditions; channel length modulation; extraction methods; lightly doped drain; maximum electric field; maximum electric field model; pseudo-two-dimensional approximation; substrate currents; Channel bank filters; Councils; Data mining; Electron mobility; Length measurement; MOS devices; MOSFETs; Numerical simulation; Testing; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.55754
  • Filename
    55754