DocumentCode :
1326356
Title :
An analytic saturation model for drain and substrate currents of conventional and LDD MOSFETs
Author :
Huang, Gwo-Sheng ; Wu, Ching-Yuan
Author_Institution :
Inst. of Electron., Nat. Chiao-Tung Univ., Hsin-Chu, Taiwan
Volume :
37
Issue :
7
fYear :
1990
fDate :
7/1/1990 12:00:00 AM
Firstpage :
1667
Lastpage :
1677
Abstract :
An analytic saturation model for conventional and lightly doped drain (LDD) MOSFETs is developed by using the pseudo-two-dimensional approximation in the channel and drain regions to obtain both the channel length modulation factor and the maximum electric field. Using the established I-V model in the linear region, the drain currents of conventional and LDD MOSFETs can be explicitly calculated. The substrate currents of conventional/LDD MOSFETs are calculated by using an existing simplified substrate current formula and the maximum electric field model. It is shown that the accuracy of the maximum electric field is acceptable for calculating the substrate currents of conventional/LDD MOSFETs. The parameters used in the model can be determined by the existing extraction methods and the optimization technique. The saturation model is shown to be valid for a wide range of channel lengths and bias conditions
Keywords :
electric fields; insulated gate field effect transistors; semiconductor device models; I-V model; LDD; MOSFETs; analytic saturation model; bias conditions; channel length modulation; extraction methods; lightly doped drain; maximum electric field; maximum electric field model; pseudo-two-dimensional approximation; substrate currents; Channel bank filters; Councils; Data mining; Electron mobility; Length measurement; MOS devices; MOSFETs; Numerical simulation; Testing; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.55754
Filename :
55754
Link To Document :
بازگشت