DocumentCode :
1326703
Title :
A precision vertical interconnect technology
Author :
Greenstein, Michael ; Matta, Farid
Author_Institution :
Hewlett Packard Lab., Palo Alto, CA, USA
Volume :
14
Issue :
3
fYear :
1991
fDate :
9/1/1991 12:00:00 AM
Firstpage :
445
Lastpage :
451
Abstract :
An interconnection technology that utilizes excimer laser drilled vias and computer-controlled plating to provide vertical (Z-axis) electrical connections in high-performance flexible circuits is described. Specifically, solid vias and hemispherical microcontacts are created with a 1-μm nearest-neighbor height precision for the microcontacts. A novel structural architecture that simplifies the ground plane connections for impedance controlled flex circuits is used. The technology is particularly suitable in the DC to 2-GHz frequency range, where large numbers of parallel connections and or multiple make-and-break connections are desirable. This technology was implemented with a polyimide substrate and nickel contacts, although the technology is applicable to other substrate and contact metallurgies
Keywords :
electric connectors; electroplating; laser beam machining; polymers; printed circuit accessories; 0 to 2 GHz; Ni contacts; computer-controlled plating; excimer laser drilled vias; ground plane connections; hemispherical microcontacts; high-performance flexible circuits; impedance controlled flex circuits; large numbers of parallel connections; mass interconnect; microcontacts; multiple make-and-break connections; polyimide substrate; precision vertical interconnect technology; solid vias; vertical electrical connections; Computer architecture; Conductors; Dielectric substrates; Fabrication; Filling; Flexible printed circuits; High performance computing; Impedance; Integrated circuit interconnections; Solids;
fLanguage :
English
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
0148-6411
Type :
jour
DOI :
10.1109/33.83925
Filename :
83925
Link To Document :
بازگشت