Title :
A generic computer simulation model to characterize photolithography manufacturing area in an IC FAB facility
Author_Institution :
Intel Corp., Chandler, AZ, USA
fDate :
9/1/1991 12:00:00 AM
Abstract :
The technique used to develop a generic simulation model to characterize the photolithography manufacturing area in a semiconductor FAB facility is discussed. Use of simulation to study the impact of policy decisions on key manufacturing system parameters like product cycle time, line throughput, work-in-progress inventory, and utilizations are discussed. Details of the structured modeling approach taken to develop reusable simulation models are also discussed. The simulation model was successfully validated and the results presented
Keywords :
digital simulation; integrated circuit manufacture; photolithography; production control; IC FAB facility; computer simulation model; line throughput; photolithography manufacturing area; product cycle time; reusable simulation models; structured modeling approach; work-in-progress inventory; Analytical models; Computer aided manufacturing; Computer simulation; Integrated circuit modeling; Lithography; Manufacturing processes; Materials handling; Power system modeling; Semiconductor device manufacture; Virtual manufacturing;
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
