Characterization of a JFET operational amplifier by planned experimentation and its impact on IC manufacturing

Author

Carlson, Arvid C. ; Sundaram, Sam L.

Author_Institution

Motorola Inc., Mesa, AZ, USA

Volume

14

Issue

3

fYear

1991

fDate

9/1/1991 12:00:00 AM

Firstpage

518

Lastpage

522

Abstract

Statistical process characterization has become an essential tool in advanced IC manufacturing to improve product quality, yield, and manufacturing efficiency. The device parameter drift of a JFET operational amplifier is discussed in terms of yield loss and product quality of analog ICs. Planned statistical experimentation was used to identify process factors that were causing the drift. The mechanisms for operational amplifier parameter drift, the improvements using statistical process characterization, and the resultant analog IC yield enhancement are described

Keywords

field effect integrated circuits; integrated circuit manufacture; linear integrated circuits; operational amplifiers; process control; quality control; IC manufacturing; JFET operational amplifier; analog IC yield enhancement; device parameter drift; manufacturing efficiency; parameter drift mechanisms; planned experimentation; planned statistical experiments; process factors identification; product quality; statistical process characterization; yield; Analog integrated circuits; Automatic testing; Circuit testing; JFET circuits; Manufacturing processes; Operational amplifiers; Packaging; Process control; System testing; Time measurement;

fLanguage

English

Journal_Title

Components, Hybrids, and Manufacturing Technology, IEEE Transactions on

Publisher

ieee

ISSN

0148-6411

Type

jour

DOI

10.1109/33.83937

Filename

83937