Title :
Highly reliable Au-Sn eutectic bonding with background GaAs LSI chips
Author :
Nishiguchi, Masanori ; Goto, Noboru ; Nishizawa, Hideaki
Author_Institution :
Sumitomo Electr. Ind. Ltd., Yokohama, Japan
fDate :
9/1/1991 12:00:00 AM
Abstract :
The authors investigate the reliability of mechanically ground chips through die-shear and thermal shock tests. The bonded chips, which were ground to 450 μm thickness by an original technology, were proved to be as reliable as polished chips through 1000 cycles of thermal shock between -65°C and +150°C. No chip fracture occurred and no induced void was observed with scanning acoustic microscopy. The shear strength of the chips after thermal shocks remained at more than 10 kg, passing the MIL-STD-883C test. Surface flaws due to backgrinding, which would cause chip fracture, were eliminated by the slight chemical etching after backgrinding. Scrubbing action has been confirmed to be necessary to obtain void-free bondings consistently in low-cost production. The Sn in the Au-Sn preform easily forms on oxide film at the surface, which tends to prevent wetting at the bonding interface. This tin oxide film (300-400 Å) was observed through Auger electron spectroscopy (AES) to be broken down by scrubbing action
Keywords :
III-V semiconductors; environmental testing; gallium arsenide; large scale integration; microassembling; reliability; -65 to 150 C; 450 micron; Al2O3 substrate; Au-Sn eutectic bonding; Auger electron spectroscopy; GaAs; GaAs LSI chips; GaAs-AuSn-Al2O3; MIL-STD-883C test; SnO film breaking; backgrinding; die attach; low-cost production; mechanically ground chips; reliability; scanning acoustic microscopy; scrubbing action; semiconductors; shear strength; slight chemical etching; thermal expansion coefficient matching; thermal shock tests; thickness; voidfree bonding; wafer thinning; Acoustic testing; Bonding; Chemicals; Electric shock; Etching; Gallium arsenide; Large scale integration; Microscopy; Surface cracks; Tin;
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on