• DocumentCode
    1327833
  • Title

    A physical and scalable I-V model in BSIM3v3 for analog/digital circuit simulation

  • Author

    Cheng, Yuhua ; Jeng, Min-Chie ; Liu, Zhihong ; Huang, Jianhui ; Chan, Mansun ; Chen, Kai ; Ko, Ping Keung ; Hu, Chenming

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
  • Volume
    44
  • Issue
    2
  • fYear
    1997
  • fDate
    2/1/1997 12:00:00 AM
  • Firstpage
    277
  • Lastpage
    287
  • Abstract
    A new physical and continuous BSIM (Berkeley Short-Channel IGFET Model) I-V model in BSIM3v3 is presented for circuit simulation. Including the major physical effects in state-of-the art MOS devices, the model describes current characteristics from subthreshold to strong inversion as well as from the linear to the saturation operating regions with a single I-V expression, and guarantees the continuities of Ids, conductances and their derivatives throughout all Vgs, Vds, and Tbs, bias conditions. Compared with the previous BSIM models, the improved model continuity enhances the convergence property of the circuit simulators. Furthermore, the model accuracy has also been enhanced by including the dependencies of geometry and bias of parasitic series resistances, narrow width, bulk charge, and DIBL effects. The new model has the extensive built-in dependencies of important dimensional and processing parameters (e.g., channel length, width, gate oxide thickness, junction depth, substrate doping concentration, etc.). It allows users to accurately describe the MOSFET characteristics over a wide range of channel lengths and widths for various technologies, and is attractive for statistical modeling. The model has been implemented in the circuit simulators such as Spectre, Hspice, SmartSpice, Spice3e2, and so on
  • Keywords
    MOS integrated circuits; MOSFET; SPICE; VLSI; circuit analysis computing; doping profiles; integrated circuit modelling; mixed analogue-digital integrated circuits; semiconductor device models; BSIM3v3; Berkeley short-channel IGFET model; DIBL effects; Hspice; MOSFET characteristics; SmartSpice; Spectre; Spice3e2; analog/digital circuit simulation; bias conditions; channel length; convergence property; gate oxide thickness; junction depth; parasitic series resistances; physical effects; processing parameters; saturation operating regions; scalable I-V model; statistical modeling; strong inversion; substrate doping concentration; Art; Circuit simulation; Convergence; Digital circuits; Doping; MOS devices; MOSFET circuits; SPICE; Semiconductor process modeling; Solid modeling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.557715
  • Filename
    557715